基于CCD高速摄影仪的直流电弧实验研究
满家健，吴翊，杨飞，孙玉书，马瑞光，吴益飞
(西安交通大学 电力设备电气绝缘国家重点实验室，陕西 西安 710049)
摘 要： 针对大容量中压直流断路器故障电流开断过程，利用CCD 高速摄影装置对电弧运动过程进行了影像捕捉。该实验是在1 400 V 直流开断实验平台上完成，分别在矩形和V 型两种不同灭弧室结构下进行直流断路器开断实验，并对比两者的开断特性。结果发现灭弧室结构对灭弧性能有重要影响，矩形灭弧室与V 型灭弧室对燃弧过程的影响差别很大。通过检测电弧影像的实验研究对大容量中压直流断路器的设计具有重要的指导意义。
关键词： 中压直流断路器；高速摄影仪；大容量开断；电弧形态；实验研究
中图分类号：TM561 文献标识码：B 文章编号：1007-3175(2015)07-0038-05
Experimental Research of DC-Arc Based on CCD High-Speed Cinetoscope
MAN Jia-jian, WU Yi, YANG Fei, SUN Yu-shu, MA Rui-guang, WU Yi-fei
（State Key Laboratory of Electrical Insulation and Power Equipment, Xi’an Jiaotong University, Xi’an 710049, China）
Abstract: In allusion to the fault current breaking process of high-capacity medium-voltage DC circuit breaker, images of arc motion were captured by CCD high-speed cinetoscope. The experiment was completed on 1 400 V DC breaking platform. Experiments were carried out on DC circuit breaker with rectangular interrupter and ‘V’ interrupter, and the breaking performances were compared. The results show that the structure of interrupter has an important influence on quenching performance. The rectangular interrupter and ‘V’interrupter were different in arcing process. The research on arc-image capture has important directive significance in design of highcapacity medium-voltage DC circuit breaker.
Key words: medium-voltage DC circuit breaker; high-speed cinetoscope; high-capacity making and breaking; arc shape; experimental research
参考文献
[1] 马钊.直流断路器的研发现状及展望[J].智能电网，2013，1(1)：12-16.
[2] 贺开华，彭海波.直流断路器大容量试验室的现状与进展[J].船电技术，2010，30(9)：55-57.
[3] 孙昊，荣命哲，马瑞光，等.空气介质直流断路器的现状[J].低压电器，2013(20)：8-10.
[4] 蔡彬，陈德桂.轨道交通的直流供电系统[J].电工技术杂志，2001(2)：10-13.
[5] 杨飞.空气介质中压直流大电流快速开断技术的研究[D].西安：西安交通大学，2010.
[6] 宁嘉琦，孙昊，纽春萍，王海燕，杨飞，吴翊，荣命哲.空气直流断路器开断特性试验研究[J].低压电器，2013(21)：5-8.
[7] 荣命哲，杨飞，吴翊，孙昊，李阳，纽春萍. 直流断路器电弧研究的新进展[J]. 电工技术学报，2014，29(1)：1-9.
[8] 满家健，纽春萍，谢成，吴翊，荣命哲，程玉标.双断点塑壳断路器操作机构动作特性分析[J].低压电器，2013(23)：1-4.
[9] Song X, Shi Z, Liu C, et al. Experimental investigation on the characteristics of vacuum arc in the process of DC interruption based on artificial current zero[C]//Isdeiv 2010：24th International Symposium on Discharges and Electrical Insulation in Vacuum, 2010.
[10] Wu Y, Rong MZ, Sun ZQ, et al. Numerical analysis of arc plasma behaviour during contact opening process in low-voltage switching device[J]. Journal of Physics D: Applied Physics, 2007, 40(3)：795-802.
